Annotation of the articleThe fabrication procedure of metallic nanocantilevers is presented. Cantilevers had a three-layer structure and were fabricated in two types: Cr/Al/Cr and Ti/Al/Ti. The cantilever thickness was 40, 80 and 120 nm, length-to-thickness ratio reached 2500. The release of cantilevers was performed by etching the sacrificial layer in SFFi plasma. In the fabrication of Cr/Al/Cr cantilevers vacuum thermal annealing was used. For Ti/Al/Ti cantilevers the most important point was the selection of the release conditions.
Keywords: nanoelectromechanical systems, nanocantilever, fabrication, plasma etching, residual stress, thermal annealing, surface